Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications

Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications

A parallel nanolithographic patterning method is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch-mask applications.

Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)

From ribbons to nanodot arrays: nanopattern design through reductive annealing.

A new approach to the generation of nanoparticle arrays in periodic as well as non-periodic fashions has been discovered based on reduction of oxidized nanoscroll/nanoribbon precursors in the transmission electron microscope (carbothermal reduction) or by hydrogen annealing. Arrays consisting of nickel arsenide nanoparticles of size 3-4 nm have been generated.

Trends in imprint lithography for biological applications.

Imprint lithography is emerging as an alternative nano-patterning technology to traditional photolithography that permits the fabrication of 2D and 3D structures with <100 nm resolution, patterning and modification of functional materials other than photoresist and is low cost, with operational ease for use in developing bio-devices. Techniques for imprint lithography, categorized as either 'mo...

Self-aligned Cu etch mask for individually addressable metallic and semiconducting carbon nanotubes.

Two means to achieve high yield of individually addressable single-walled carbon nanotubes (CNTs) are developed and examined. The first approach matches the effective channel width and the density of horizontally aligned CNTs. This method can provide single CNT devices and also allows control over the average number of CNTs per channel. The second and a more deterministic approach uses self-ali...